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- 2" DC Plasma Magnetron Sputtering Coater for Conductive Thin Films
2" DC Plasma Magnetron Sputtering Coater for Conductive Thin Films
Other Machinery & Industry Equipment | Other Machinery & Industry Equipment
USD 17,500.00 - 21,000.00 / Unit
1
100
China
No
Product Description:
CY-MSP300S-DC is a compact magnetron sputtering system with one 2" target sources. DC source for coating metallic material. A film thickness tracker is included to enable the user to control processing easily. This coater is designed for coating both single or multiple film layers for a wide range of materials, such as alloy, ferroelectric, semiconductor, ceramic, dielectric, optical, PTFE etc. Its compactness and ease of operation make it an ideal coating system for use in R&D labs. Technical parameters Input Power 220VAC 50/60Hz, single phase 2000W (including pump) Magnetron Sputtering Head One 2" Magnetron Sputtering Head with water cooling jackets are included to connect optional power source Head Water Cooling: 10ml/min water flow required Vacuum Chamber Vacuum Chamber: 300 mm Dia x 300 mm height, made of high purity quartz Sample Holder Sample holder size: 185mm Rotate speed:1-20rpm adjustable The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C Vacuum Pump Station High speed turbo vacuum pump system is directly installed on the vacuum chamber for max. vacuum level Heavy duty dual stage mechanical pump is connected to turbo pump for faster pump speed Mobile pump station is included and the compact sputtering coater can be put on top of station Max. vacuum level: 10^-6 torr with chamber baking Thickness Monitor One Precision quartz thickness sensor is built into the chamber to monitor coating thickness with accuracy 0.10 Å LED Display Unit outside chamber can: Input material to be coated according to data base included Display total thickness coated and coating speed 3.5 pcs quartz sensors (consumable) are included Water cooling is required Warranty One years limited warranty with lifetime support
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